ultrahigh-vacuum deposition

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• Vacuum — This article is about empty physical space or the absence of matter. For other uses, see Vacuum (disambiguation). Free space redirects here. For other uses, see Free space (disambiguation). Pump to demonstrate vacuum In everyday usage, vacuum is… …   Wikipedia

• vacuum technology — Introduction       all processes and physical measurements carried out under conditions of below normal atmospheric pressure. A process or physical measurement is generally performed in a vacuum for one of the following reasons: (1) to remove the …   Universalium

• Vacuum pump — A vacuum pump is a device that removes gas molecules from a sealed volume in order to leave behind a partial vacuum. The vacuum pump was invented in 1650 by Otto von Guericke. Types Pumps can be broadly categorized according to three… …   Wikipedia

• Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

• Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

• radiation — radiational, adj. /ray dee ay sheuhn/, n. 1. Physics. a. the process in which energy is emitted as particles or waves. b. the complete process in which energy is emitted by one body, transmitted through an intervening medium or space, and… …   Universalium

• Mathematics and Physical Sciences — ▪ 2003 Introduction Mathematics       Mathematics in 2002 was marked by two discoveries in number theory. The first may have practical implications; the second satisfied a 150 year old curiosity.       Computer scientist Manindra Agrawal of the… …   Universalium

• Field electron emission — It is requested that a diagram or diagrams be included in this article to improve its quality. For more information, refer to discussion on this page and/or the listing at Wikipedia:Requested images. Field emission (FE) (also known as field… …   Wikipedia

• Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… …   Wikipedia

• Depot chimique en phase vapeur — Dépôt chimique en phase vapeur Le dépôt chimique en phase vapeur (ou CVD pour l anglais chemical vapor deposition) est une méthode de dépôt de films minces, à partir de précurseurs gazeux. Sommaire 1 Principe 2 Variantes du dépôt chimique en… …   Wikipédia en Français

• Dépôt Chimique En Phase Vapeur — Le dépôt chimique en phase vapeur (ou CVD pour l anglais chemical vapor deposition) est une méthode de dépôt de films minces, à partir de précurseurs gazeux. Sommaire 1 Principe 2 Variantes du dépôt chimique en phase vapeur 3 …   Wikipédia en Français